Editorial board

Founding Editor and Emeritus Editor

George W. Taylor (Editor-in-Chief: 1992-2023)

Princeton Resources, P.O. Box 211

Princeton, New Jersey 08542-0211, USA

Editors

Carlos A. Paz de Araujo

Department of Electrical and Computer Engineering

University of Colorado

Colorado Springs, Colorado 80933-7150, USA

Deborah J. Taylor

Crawley Research Associates

3300 Bee Cave Road Suite 560-226

Austin, Texas 78746, U.S.A


Associate Editors

Orlando Auciello, Materials Science & Engineering, University of Texas-Dallas, Richardson, TX 75080

Yoshihiro Ishibashi, Professor Emeritus, Nagoya University, Nagoya, 466-0851, Japan

Ram Ramesh, Materials Research Science & Engineering, University of Maryland, College Park, MD 20742, USA

James F. Scott, Cavendish Laboratory, University of Cambridge

Tadashi Shiosaki, Graduate School of Materials Science, Nara Institute of Science and Technology, Nara 630-0101, Japan

Alexander S. Sigov Moscow Technological University (MIREA), Prospekt Vernadskogo 78, Moscow 117454, Russia

Wolfram Wersing, Corporate Research and Development, Siemens AG, Otto-Hahn-Ring 6, W-8000, Munchen 83 Germany


Review Articles Editor

Amar Bhalla, Department of Electrical & Computer Engineering, University of Texas at San Antonio, One UTSA Circle, San Antonio, TX 78249, USA


Editorial Board

M. Adachi, Toyoma, Japan

C.L. Chen, San Antonio, Texas, USA

C.L. Choy, Kowloon, Hong Kong

M.W. Cole, Aberdeen, Maryland, USA

Hailin Cong, Qingdazo, China

S.K. Dey, Tempe, Arizona, USA

Duncinei Garcia, Sao Carlos, Brazil

A. Grekov, Rostov-on-Don, Russia

G.H. Haertling, Albuquerque, New Mexico, USA

R. Katiyar, San Juan, Puerto Rico

H.-G. Kim, Seoul, Korea

S.S. Kim, Kyungnam, South Korea

A.I. Kingon, Raleigh, North Carolina, USA

Hathaikarn Manuspiya, Bangkok, Thailand

T. Mihara, Tokyo, Japan

F.A. Miranda, Cleveland, Ohio, USA

Y. Miyasaka, Kawasaki, Japan

M. Noda, Osaka, Japan

M. Okuyama, Osaka, Japan

R. Panholzer, Monterey, California, USA

B. Ploss, Jena, Germany

Shashank Priya, Blacksburg, Virginia USA

Avadh, Saxena, Los Alamos, New Mexico, USA

N. Setter, Lausanne, Switzerland

M. Shimizu, Hyogo, Japan

V. Ya Shur, Ekaterinburg, Russia

R.P. Tandon, Delhi, India

M.A. Todd, Malvern, UK

Tatyana Volk, Moscow, Russia

Y. Watanabe, Fukuoka, Japan

R. Whatmore, Towcester, UK

W. Zhu, Singapore